The microscopic mechanism of surfactant epitaxy by molecular dynamics

The microscopic mechanism of surfactant epitaxy by molecular dynamics
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分子动力学研究表面活性剂外延的微观机制

DOI:
10.1088/0965-0393/4/1/007
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发表时间:
1996
影响因子:
1.8
通讯作者:
R. Yamamoto
R. Yamamoto
中科院分区:
材料科学3区
文献类型:
--
作者:
K.Mae K.Mae;K. Kyuno;R. Yamamoto

文献摘要

被引文献

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表面活性剂外延有望成为薄膜从三维岛状生长到层状生长的有力手段,但表面活性剂外延的原子级过程尚未被揭示。本文的目的是阐明表面活性剂外延现象的分子动力学模拟。结果表明,较小的表面能是表面活性剂稳定在表面的必要条件,表面活性剂与吸附原子之间的原子半径差在它们快速交换位置的过程中起着重要作用。
Surfactant epitaxy has been expected to be a powerful method to improve thin-film growth from 3D island to layered growth, but the atomic level process of surfactant epitaxy has not been revealed yet. The purpose of this paper is to elucidate the phenomenon of surfactant epitaxy by molecular dynamic simulations. It is found that a smaller surface energy is necessary for the surfactant to be stable on the surface and that the difference of the atomic radii between the surfactant and the adatom plays an important role in the process of quick exchange of their positions.