Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation
Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation
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利用产酸链式反应提高化学放大型抗蚀剂辐射敏感性的方法
DOI：
10.1117/12.388322
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发表时间：
2000
期刊：
影响因子：
--
通讯作者：
S. Okazaki
中科院分区：
文献类型：
--
作者：
S. Nagahara;Yusuke Sakurai;Masanori Wakita;Yukio Yamamoto*;S. Tagawa;M. Komuro;E. Yano;S. Okazaki
通过在酸生成过程中引入自由基链反应，探讨了提高抗蚀剂敏感性的途径。考察了各种离子和非离子酸发生器在不同溶剂和薄膜中的产酸率，以寻找最有效的自由基链酸增殖反应体系。利用链反应中电子转移反应的吉布斯自由能变化对酸扩散进行了讨论。实现链式反应最有效的系统是碘盐酸发生器和二次醇酸放大器的组合。在含有碘盐和醇类化合物的丙烯酸聚合物抗蚀剂中，电子束光刻提高了抗蚀剂的灵敏度。
The approach toward the enhancement of the resist sensitivity was investigated by introducing the radical chain reactions into the acid generation processes. The acid yields of various ionic and nonionic acid generators in some solvents and films were examined to search the most efficient system of the radical chain acid proliferation reactions. The acid proliferation was discussed using Gibbs free energy change of the electron transfer reactions in the chain reactions. The most efficient system to realize the chain reactions was the combination of iodonium salt acid generator and secondary alcohol acid amplifiers. In acrylic polymer resists containing the iodonium salt and the alcohol compounds, resist sensitivity was enhanced in electron beam lithography.