Defect Removal in the Course of Directed Self-Assembly is Facilitated in the Vicinity of the Order-Disorder Transition
Defect Removal in the Course of Directed Self-Assembly is Facilitated in the Vicinity of the Order-Disorder Transition
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在有序-无序转变附近有利于定向自组装过程中的缺陷去除
DOI：
10.1103/physrevlett.113.168301
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发表时间：
2014-10-15
影响因子：
8.6
通讯作者：
Mueller, Marcus
中科院分区：
文献类型：
--
作者：
Li, Weihua;Nealey, Paul F.;Mueller, Marcus
用自洽场理论研究了对称二嵌段共聚物在化学图像化基底上的薄膜中原型缺陷形态的稳定性。通过计算最小自由能路径，得到缺陷的多余自由能和缺陷去除机构的势垒。不同的缺陷去除机制表明：(i)缺陷在有序-无序过渡以上的不相容特征值chi N-*时变得不稳定，（ii）弱偏析时动力学加速。数值结果被放置在物理机制的背景下，并对定向自组装的影响进行了讨论。
The stability of prototypical defect morphologies in thin films of symmetric diblock copolymers on chemically patterned substrates is investigated by self-consistent field theory. The excess free energy of defects and barriers of defect-removal mechanisms are obtained by computing the minimum free-energy path. Distinct defect-removal mechanisms are illustrated demonstrating that (i) defects will become unstable at a characteristic value of incompatibility chi N-* above the order-disorder transition and (ii) the kinetics is accelerated at weak segregation. Numerical findings are placed in the context of physical mechanisms, and implications for directed self-assembly are discussed.