Modeling directed self-assembly of nanoparticles under parallel electric fields
Modeling directed self-assembly of nanoparticles under parallel electric fields
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模拟平行电场下纳米颗粒的定向自组装
DOI：
10.1088/1742-6596/1391/1/012006
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发表时间：
2019
期刊：
影响因子：
--
通讯作者：
I. Mazilu
中科院分区：
文献类型：
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作者：
M. Withers;E. Baker;D. Mazilu;I. Mazilu
我们设计并模拟了一个实验来研究电偏压对离子纳米粒子自组装过程中产生的粒子覆盖密度的影响。该实验涉及在二氧化硅纳米粒子的自组装过程中施加平行于玻璃基板的均匀外部电场。我们将此过程称为定向自组装单层（DSAM）。在我们的理论分析中，我们修改现有的合作顺序吸附模型，考虑到在外加电场下的扩散。我们使用平均场近似来求解粒子覆盖密度。为了确定这种方法的有效性，我们比较我们的解决方案的Monte Carlo模拟系统。
We design and model an experiment to study the effect of electric bias on particle-coverage densities produced during ionic nanoparticle self-assembly. The experiment involves the application of a uniform external electric field parallel to a glass substrate during the self-assembly of silica nanoparticles. We refer to this procedure as directed self-assembly of monolayers (DSAM). In our theoretical analysis, we modify existing cooperative sequential adsorption models to account for diffusion under an applied electric field. We use the mean field approximation to solve for particle-coverage densities. To ascertain the validity of this method, we compare our solutions to Monte Carlo simulations of the system.