Nondegradative Dielectric Coating on Graphene by Thermal Evaporation of SiO
Nondegradative Dielectric Coating on Graphene by Thermal Evaporation of SiO
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DOI：
10.7567/jjap.52.125102
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发表时间：
2013-11
影响因子：
1.5
通讯作者：
Seiya Suzuki;Chien-Chung Lee;Takashi Nagamori;T. Schibli;M. Yoshimura
中科院分区：
文献类型：
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作者：
Seiya Suzuki;Chien-Chung Lee;Takashi Nagamori;T. Schibli;M. Yoshimura
由于碳-碳键不可避免地暴露于沉积期间存在的等离子体、高能离子或高能光子，将介电材料沉积到石墨烯上而不引入原子缺陷是具有挑战性的。在这里，我们报告了一个简单的和nondegradative的方法沉积氧化硅层的石墨烯的基础上的一氧化硅（SiO）的热蒸发。拉曼光谱和绘图表明，这种方法不会在石墨烯中形成缺陷，而通过电子束蒸发沉积氧化硅会严重损坏石墨烯。SiO-coated graphene还显示出优异的耐臭氧和热空气性能。由于SiO对可见光和红外光是透明的，因此涂层可以用作石墨烯光学器件（例如光电探测器和电光调制器）的保护层。还应注意，本方法比原子层沉积简单得多，原子层沉积需要石墨烯的额外官能化。
The deposition of dielectric materials onto graphene without introducing atomic defects is challenging owing to the unavoidable exposure of carbon–carbon bonds to plasma, energetic ions, or high-energy photons that are present during deposition. Here, we report a simple and nondegradative method of depositing a silicon oxide layer on graphene based on the thermal evaporation of silicon monoxide (SiO). Raman spectroscopy and mapping showed that this method does not form defects in graphene, whereas depositing silicon oxide by e-beam evaporation severely damages graphene. The SiO-coated graphene also showed excellent resistance to ozone and hot air. Since SiO is transparent to visible light and infrared light, the coating may serve as a protective layer for graphene optical devices such as photodetectors and electro-optic modulators. Also noted that the present method is much simpler than atomic layer deposition, which requires additional functionalization of graphene.