Effect of bilayer period on CrN/Cu nanoscale multilayer thin films
Effect of bilayer period on CrN/Cu nanoscale multilayer thin films
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DOI：
10.1016/j.surfcoat.2008.06.028
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发表时间：
2008-08
影响因子：
5.4
通讯作者：
Youn J. Kim;T. J. Byun;H. Lee;J. Han
中科院分区：
文献类型：
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作者：
Youn J. Kim;T. J. Byun;H. Lee;J. Han
采用闭合场非平衡磁控溅射法（CFUBMS）制备了CrN/Cu多层膜结构，该多层膜结构由硬过渡金属氮化物和软金属层构成的超硬涂层组成。所有层压层的双层厚度（λ）通过基板保持器的旋转速度控制在4.7至47.1 nm的范围内。采用高分辨X射线衍射（HRXRD）和场发射透射电子显微镜（FETEM）研究了涂层的结构表征。CrN/Cu纳米多层膜的择优取向为CrN（200）和Cu（200）。用原子力显微镜（AFM）观察了薄膜的表面形貌。通过纳米压痕测试和球盘测试确定的涂层的机械性能随着双层厚度（λ）而变化。双层厚度为7.9 nm的多层膜具有高硬度、高抗塑性变形性和高耐磨性。
Thin films with a CrN/Cu multilayer structure comprising a superhard coating with a lamination of hard transition metal nitride and soft metal were synthesized by Closed Field Unbalanced Magnetron Sputtering (CFUBMS). The bilayer thickness (λ) of all of the laminated layers was controlled via the rotational speed of the substrate holder within the range from 4.7 to 47.1 nm. The structural characterization of the coatings was investigated using high resolution X-ray diffraction (HRXRD) and field emission transmission electron microscopy (FETEM). The preferred orientation of the CrN/Cu nanoscale multilayer thin films was CrN (200) and Cu (200). The surface morphology of the films was examined by atomic force microscopy (AFM). The mechanical properties of the coatings, as determined by nano-indentation testing and the ball-on-disc test varied with the bilayer thickness (λ). The multilayer with a bilayer thickness of 7.9 nm exhibited high hardness, high resistance to plastic deformation, and high wear resistance.