Alteration for a diffusion barrier design concept in future high-density dynamic and ferroelectric random access memory devices

Alteration for a diffusion barrier design concept in future high-density dynamic and ferroelectric random access memory devices
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DOI:
10.1016/s0079-6425(02)00012-9
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发表时间:
2003
影响因子:
37.4
通讯作者:
D. Yoon;J. Roh;Sung-man Lee;H. Baik
D. Yoon;J. Roh;Sung-man Lee;H. Baik
中科院分区:
材料科学1区
文献类型:
--
作者:
D. Yoon;J. Roh;Sung-man Lee;H. Baik

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