Comparison of NiTi thin films sputtered from separate elemental targets and Ti-rich alloy targets
Comparison of NiTi thin films sputtered from separate elemental targets and Ti-rich alloy targets
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DOI：
10.1016/j.jmatprotec.2015.01.014
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发表时间：
2015-06
影响因子：
6.3
通讯作者：
W. Tillmann;S. Momeni
中科院分区：
文献类型：
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作者：
W. Tillmann;S. Momeni
溅射靶的种类对近等原子NiTi薄膜的微观结构、相变行为、力学性能和摩擦学性能有不利影响。这一新发现进行了系统的研究，采用全面的表征和分析技术，包括X射线衍射（XRD），场发射扫描电子显微镜（FESEM），差示扫描量热法（DSC），纳米压痕，球盘，和三维（3D）光学显微镜。
The kind of sputtering targets can adversely affect the microstructure, phase transformation behavior, mechanical and tribological properties of near equi-atomic NiTi thin films. This new finding was systematically investigated by employing comprehensive characterization and analysis techniques, including X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), differential scanning calorimetry (DSC), nanoindentation, ball-on-disc, and three dimensional (3D) optical microscopy.