A new flexible scatterometer for critical dimension metrology.
A new flexible scatterometer for critical dimension metrology.
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DOI：
10.1063/1.3280160
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发表时间：
2010-02
期刊：
影响因子：
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通讯作者：
M. Wurm;F. Pilarski;B. Bodermann
中科院分区：
文献类型：
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作者：
M. Wurm;F. Pilarski;B. Bodermann
德国国家计量研究所（Physikalisch-Technische Bundesanstalt）研制并建立了一种新型深紫外散射仪。该系统的概念是非常可变和通用的，因此可以执行许多不同类型的测量，例如经典散射测量，椭偏散射测量，偏振相关反射测量和椭偏测量。其主要应用是表征周期性纳米结构表面的线宽/临界尺寸（CD）、光栅周期（节距）和边缘轮廓，主要但不仅限于光掩膜。可以使用840到193nm之间的不同操作波长，也可以使用各种不同的波长计量与最先进的光刻技术相连接。它允许适应和改变测量和测量几何，以优化测量问题的灵敏度和无歧义性。本文详细介绍了该系统的概念、设计和性能。首先给出了测量实例，并讨论了当前和未来的应用。
At Physikalisch-Technische Bundesanstalt, the National Metrology Institute of Germany, a new type of deep ultraviolet scatterometer has been developed and set up. The concept of the system is very variable and versatile, so that many different types of measurements, e.g., classical scatterometry, ellipsometric scatterometry, polarization-dependent reflectometry, and ellipsometry can be performed. The main application is the characterization of linewidth/critical dimension (CD), grating period (pitch), and edge profile of periodically nanostructured surfaces mainly, but not only, on photomasks. Different operation wavelength between 840 and 193 nm can be used, giving also access to a variety of different at-wavelength metrology connected with state-of-the-art photolithography. It allows to adapt and to vary the measurand and measurement geometry to optimize the sensitivity and the unambiguity for the measurement problem. In this paper the concept, design, and performance of the system is described in detail. First measurement examples are shown and current and future applications are discussed.