Simulation of Ultrasubmicrometer-Gate $hbox{In}_{0.52} hbox{Al}_{0.48}hbox{As/In}_{0.75}hbox{Ga}_{0.25}hbox{As/In}_{0.52}hbox{Al}_{0.48}hbox{As/InP}$ Pseudomorphic HEMTs Using a Full-Band Monte Carlo Simulator
Simulation of Ultrasubmicrometer-Gate $hbox{In}_{0.52} hbox{Al}_{0.48}hbox{As/In}_{0.75}hbox{Ga}_{0.25}hbox{As/In}_{0.52}hbox{Al}_{0.48}hbox{As/InP}$ Pseudomorphic HEMTs Using a Full-Band Monte Carlo Simulator
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超亚微米栅极模拟 $hbox{In}_{0.52} hbox{Al}_{0.48}hbox{As/In}_{0.75}hbox{Ga}_{0.25}hbox{As/In
DOI:
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发表时间:
2007
影响因子:
3.1
通讯作者:
M. Saraniti
中科院分区:
文献类型:
--
作者:
J. Ayubi;D. Ferry;S. Goodnick;R. Akis;M. Saraniti
Pseudomorphic delta-doped ultrasubmicrometer-gate high-electron mobility transistors have been modeled using a full-band cellular Monte Carlo simulator. Reasonable agreement between experimental and numerical results is obtained for a 70-nm gate length. We discuss the scaling of this device to shorter gate lengths and the role played by various dimensions in the structure. Devices with 20-nm gate lengths should produce fTs above 1.5 THz without difficulty. This paper demonstrates the power of particle-based simulation tools in capturing the relevant physics responsible for device operation and key to performance optimization.