Fine Patterning and Characterization of Gel Films Derived from Methyltriethoxysilane and Tetraethoxysilane
Fine Patterning and Characterization of Gel Films Derived from Methyltriethoxysilane and Tetraethoxysilane
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甲基三乙氧基硅烷和四乙氧基硅烷凝胶薄膜的精细图案化和表征
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发表时间：
2005
期刊：
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通讯作者：
T. Minami
中科院分区：
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作者：
A. Matsuda;Y. Matsuno;M. Tatsumisago;T. Minami
通过在直径为130 mm的玻璃盘基片上用压模对xCH_3Si（OC_2 H_5）_3（100 - x）Si（OC_2 H_5）_4衍生的凝胶膜（60 ≤x≤ 100 mol%）进行压制，成功地压印出了用于光学数据存储的1.6 μm间距的预刻槽。当x <40mol%时，所得膜太硬而不能均匀地涂覆图案。当60小于等于x小于等于100摩尔%时，即使在350°C下热处理后，所有膜的图案的收缩率也为约4%，从而保持了压模的近净负形状。薄膜中的甲基在500° C至600°C的温度下分解。
Pregrooves of 1.6 µm pitch for optical data storage have been embossed successfully by pressing a stamper against xCH3Si(OC2H5)3(100 - x)Si(OC2H5)4-derived gel films (60 ≤x≤ 100 mol%) on glass-disk substrates of 130 mm diameter. When x is <40 mol%, the resultant films are too hard to emboss patterns uniformly. The shrinkage of the patterns is ∼4% for all the films when 60 lessthan equal to x lessthan equal to 100 mol%, even after heat treatment at 350°C, so that the nearly net negative shape of the stamper is preserved. The methyl groups in the films decompose at temperatures from 500° to 600°C.