Site-selective growth of metal-organic frameworks using an interfacial growth approach combined with VUV photolithography
Site-selective growth of metal-organic frameworks using an interfacial growth approach combined with VUV photolithography
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DOI：
10.1039/c6ra18340a
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发表时间：
2016-01-01
期刊：
影响因子：
3.9
通讯作者：
Akamatsu, Kensuke
中科院分区：
文献类型：
--
作者：
Tsuruoka, Takaaki;Matsuyama, Tetsuhiro;Akamatsu, Kensuke
我们报告了一种独特的金属有机框架（MOF）位点选择性生长方法。 MOF 的位点选择性生长可以通过在金属离子掺杂的聚合物基板上制造聚合物光刻胶图案，然后通过浸入有机配体溶液中构建框架来实现。
We report a unique method for the site-selective growth of metalorganic frameworks (MOFs). The site-selective growth of MOFs can be achieved by fabricating a pattern of polymer photoresist on the metalion-doped polymer substrate and then constructing frameworks by immersion in an organic ligand solution.