Superconformal Electrodeposition of Co and Co-Fe Alloys Using 2-Mercapto-5-benzimidazolesulfonic Acid
Superconformal Electrodeposition of Co and Co-Fe Alloys Using 2-Mercapto-5-benzimidazolesulfonic Acid
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DOI：
10.1149/1.3142427
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发表时间：
2009-01-01
影响因子：
3.9
通讯作者：
Moffat, Thomas P.
中科院分区：
文献类型：
--
作者：
Lee, Chang Hwa;Bonevich, John E.;Moffat, Thomas P.
研究了在2-巯基-5-苯并咪唑磺酸（MBIS）存在下，电沉积的超适形Co（Fe）填充亚微米沟槽。MBIS抑制Co沉积的开始。抑制击穿的特征是滞后伏安和时间电流瞬态上升。正反馈过程反映了MBIS吸附与解吸、消耗之间的竞争，后者与质子还原和金属沉积反应密切相关。无孔洞的Co沟槽充填通过在底角优先沉积金属来进行，导致v形缺口的界面形状，随后是几何找平。无空隙填充也演示了通过几何形状。富Co-Fe合金获得了几乎相同的超共形沟填充。透射电镜分析和x射线能谱分析表明，填充沟内的铁钴比是均匀的。MBIS对Co或Co- fe合金镀层的磁性没有明显的扰动。
Superconformal Co(Fe) filling of submicrometer trenches by electrodeposition is demonstrated in the presence of 2-mercapto-5-benzimidazolesulfonic acid (MBIS). MBIS inhibits the initiation of Co deposition. Inhibition breakdown is characterized by hysteretic voltammetry and rising chronoamperometric transients. The positive feedback process reflects the competition between MBIS adsorption and its desorption, and consumption, with the latter being closely coupled with proton reduction and the metal deposition reaction. Void-free Co trench filling proceeds by preferential metal deposition at the bottom corners leading to a V-notch interface shape that is followed by geometrical leveling. Void-free filling is also demonstrated for a via geometry. Almost identical superconformal trench filling is obtained for Co-rich Co-Fe alloys. Analytical transmission electron microscopy and energy dispersive X-ray analysis indicate that the Fe/Co ratio within the filled trenches is uniform. MBIS does not significantly perturb the magnetic properties of the Co or Co-Fe alloy deposits.