Nanometer-Scale Layer Removal of Aluminum and Polystyrene Surfaces by Ultrasonic Scratching
Nanometer-Scale Layer Removal of Aluminum and Polystyrene Surfaces by Ultrasonic Scratching
复制标题
通过超声波刮擦去除铝和聚苯乙烯表面的纳米级层
DOI：
10.1143/jjap.36.3834
复制
发表时间：
1997
影响因子：
1.5
通讯作者：
Akira Sasaki Akira Sasaki
中科院分区：
文献类型：
--
作者：
F. Iwata;Makoto Kawaguchi;Hisayuki Aoyama Hisayuki Aoyama;Akira Sasaki Akira Sasaki
An atomic force microscope combined with a quartz crystal resonator have been employed for nanometer-scale layer removal by ultrasonic scratching. The atomic force microscope has a very sharp diamond tip mounted on the end of a cantilever for surface scratching. Sample thin films are deposited on the surface of an AT-cut quartz crystal resonator which is able to oscillate the surface laterally at its resonance frequency of 5 MHz. Surfaces of aluminum and polystyrene were scratched with x-y scanning of 3×3 µ m2 with a micronewton loading force, and the topographies of the scratched areas were observed. Scratching with surface oscillation can result in deep carving of the surface in spite of a low loading force which is not sufficient for removal of the surface without oscillation. The hollow bottom of the polystyrene surface which was scratched with surface oscillation was obviously flat in comparison with the surface scratched without oscillation.
