Site-Selective Formation of Polymer Ultrathin Films Using the Ink-Jet Method onto Patterned Fluoroalkylsilane Monolayer Substrate
Site-Selective Formation of Polymer Ultrathin Films Using the Ink-Jet Method onto Patterned Fluoroalkylsilane Monolayer Substrate
复制标题
DOI:
10.1380/jsssj.27.108
复制
发表时间:
2006
期刊:
影响因子:
--
通讯作者:
M. Morita;Shigekazu Yasutake;H. Ishizuka;J. Fukai;A. Takahara
中科院分区:
文献类型:
--
作者:
M. Morita;Shigekazu Yasutake;H. Ishizuka;J. Fukai;A. Takahara
We have proposed herein a novel microfabrication method for polymer ultrathin films that utilizes fluoroalkylsilane monolayer patterned substrates and ink-jet technology. The purpose of this study is to establish the fundamental methods for site-selective formation of polymer thin film utilizing wetting contrast of patterned fluoroalkylsilane monolayer (Rf)/si-lanol (Si-OH) surfaces. Rf/Si-OH patterned surface prepared by the VUV-rays lithography have lyophobic Rf and lyophilic Si-OH phases, respectively. Polystyrene/xylene solution was used to coat the patterned surface with wetting contrast by the ink-jet method. The patterned polystyrene ultrathin films were selectively formed on lyophilic areas.