Pinch plasma EUV source with particle injection
Pinch plasma EUV source with particle injection
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带粒子注入的夹紧等离子体 EUV 源
DOI：
10.1088/0022-3727/37/23/008
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发表时间：
2004
期刊：
影响因子：
--
通讯作者：
M. McGeoch
中科院分区：
文献类型：
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作者：
M. McGeoch
将锡液滴注入到氩或氦箍缩放电中可以提供高的极紫外（EUV）产生效率以及小的等离子体尺寸。我们估计了气体箍缩放电中球形固体密度靶的蒸发、电离和膨胀速率。据发现，粒子的初始趋势，成为负电荷减少电子从等离子体的热传输。负电荷被抵消，和电子热通量增强，通过离子对表面的影响和光电发射依赖于等离子体辐射光谱的二次电子的产生。当热通量超过1 GW cm−2时，粒子可以非常迅速地膨胀并膨胀到与箍缩等离子体相当的直径。电离所需的时间和最终半径分别估计为粒子大小，等离子体密度和温度的函数。结果表明，星星箍缩极紫外光源中的等离子体条件适合于通过粒子注入产生高亮度极紫外光。
Injection of tin droplets into an argon or helium pinch discharge can provide high extreme ultraviolet (EUV) generation efficiency together with small plasma size. We estimate the rates of evaporation, ionization and expansion of a spherical solid density target in a gas pinch discharge. It is found that an initial tendency for the particle to become negatively charged reduces electron heat transport from the plasma. Negative charging is counteracted, and electron heat flux enhanced, by the generation of secondary electrons by ion impact on the surface and by photoemission dependent on the plasma radiation spectrum. When the heat flux exceeds 1 GW cm−2 the particle can ionize and expand very rapidly to a diameter comparable to that of the pinch plasma. The time required for ionization and the final radius are each estimated as a function of particle size, plasma density and temperature. It is demonstrated that the plasma conditions in the Star Pinch EUV source are suitable for high brightness EUV generation via particle injection.