Remote plasma-enhanced metalorganic chemical vapor deposition of aluminum oxide thin films
Remote plasma-enhanced metalorganic chemical vapor deposition of aluminum oxide thin films
复制标题
氧化铝薄膜的远程等离子体增强金属有机化学气相沉积
DOI：
--
复制
发表时间：
2008
期刊：
影响因子：
--
通讯作者：
M. Sanden
中科院分区：
文献类型：
--
作者：
I. Volintiru;M. Creatore;J. L. Hemmen;M. Sanden
采用远程等离子体增强金属有机化学气相沉积法从氧/三甲基铝混合物中沉积氧化铝薄膜。通过原位光谱椭圆偏振法的初步研究表明，在<150 °C的温度下沉积的氧化铝膜是多孔的。由于老化，发现1.38的低折射率在环境条件下增加到1.52。为了改善薄膜性能，探索了两条路线。首先，通过增加衬底温度，在400 °C下获得折射率为1.48的膜，伴随着OH浓度的强烈降低，如红外光谱所示。其次，通过施加额外的射频偏压的基板的原位折射率增加到1.60和OH基团被定量地删除。
Aluminum oxide films were deposited using remote plasma-enhanced metalorganic chemical vapor deposition from oxygen/trimethylaluminum mixtures. Initial studies by in situ spectroscopic ellipsometry demonstrated that the aluminum oxide films deposited at temperatures <150 °C were porous. The low refractive index of 1.38 was found to increase to 1.52 under ambient conditions, due to ageing. In order to improve the film properties, two routes were explored. First, by increasing the substrate temperature films with a refractive index of 1.48 were obtained at 400 °C, accompanied by a strong decrease in OH concentration, as shown by infrared spectroscopy. Second, by applying an additional rf bias to the substrate the in situ refractive index increased up to 1.60 and the OH groups were quantitatively removed.