Optimizing the immobilization of gold nanoparticles on functionalized silicon surfaces: amine- vs thiol-terminated silane
Optimizing the immobilization of gold nanoparticles on functionalized silicon surfaces: amine- vs thiol-terminated silane
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DOI：
10.1007/s13404-013-0120-y
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发表时间：
2013-01-01
期刊：
影响因子：
2.2
通讯作者：
Boujday, Souhir
中科院分区：
文献类型：
--
作者：
Ben Haddada, Maroua;Blanchard, Juliette;Boujday, Souhir
将金纳米粒子固定在平面上是许多科学界非常感兴趣的问题，包括化学家、物理学家、生物学家以及在这些学科之间工作的各种社区。控制固定步骤，特别是纳米颗粒的分散和覆盖，对所有这些社区来说都是一个重要的问题。我们从末端化学功能的性质入手，研究了影响这种相互作用的参数。因此，我们小心地接枝了从氨基丙基三乙氧基硅烷(APTES)或巯丙基三乙氧基硅烷(APTES)开始的以胺或硫醇为端基的硅烷。我们还通过在APTES修饰的层上共价接枝硫代十一酸(MUA)来改变硫醇封端层的链长，并通过纳米颗粒沉积的方案来评估是否必须考虑其他因素来使这种相互作用合理化。用X射线光电子能谱对所形成的膜进行了表征，并用扫描电子显微镜和表面增强拉曼散射对金纳米颗粒的沉积进行了监测。我们观察到，根据硅表面化学层的性质，纳米颗粒的分散性和密度存在显著差异。在沉积过程中使用超声波非常有效地限制了聚集体的形成。通过APTES和APTES/MUA功能化得到了最佳的沉积工艺。他们在覆盖率、分散度和孤立纳米颗粒的密度方面进行了比较。APTES/MUA表面清楚地显示出更好的结果，这可能是由于硫醇末端基团的较长链和稀释所引起的。
Immobilization of gold nanoparticles on planar surfaces is of great interest to many scientific communities; chemists, physicists, biologists, and the various communities working at the interfaces between these disciplines. Controlling the immobilization step, especially nanoparticles dispersion and coverage, is an important issue for all of these communities. We studied the parameters that can influence this interaction, starting with the nature of the terminal chemical function. Thus, we have carefully grafted silanes terminated by either amine or thiol groups starting from aminopropyltriethoxysilane (APTES) or mercaptopropyltriethoxysilane. We also changed the chain length for thiol-terminated layers through covalent grafting of mercaptoundecanoic acid (MUA) on APTES-modified layers, and the protocol of nanoparticles deposition to evaluate whether other factors must be taken into consideration to rationalize this interaction. The formed layers were characterized by X-ray photoelectron spectroscopy and gold nanoparticles deposition was monitored by scanning electron microscopy and surface-enhanced Raman scattering. We observed significant differences in terms of nanoparticles dispersion and density depending on the nature of the chemical layer on silicon. The use of ultrasounds during the deposition process was very efficient to limit aggregates formation. The optimal deposition procedures were obtained through the use of APTES and APTES/MUA functionalization. They were compared in terms of coverage, dispersion, and densities of isolated nanoparticles. The APTES/MUA surfaces clearly showed better results that may arise from both the longer chain and the dilution of thiol end groups.