Electrical characteristics and lifetimes of microdischarge devices having thin dielectric films of aluminum oxide,boron nitride, or barium titanate

Electrical characteristics and lifetimes of microdischarge devices having thin dielectric films of aluminum oxide,boron nitride, or barium titanate
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具有氧化铝、氮化硼或钛酸钡介电薄膜的微放电装置的电特性和寿命

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发表时间:
2003
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通讯作者:
J. Eden
J. Eden
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文献类型:
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作者:
S. Park;J. Eden

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研究了厚度分别为120或200 μm、30 μm和5 μm的Al 2 O3、BN和BaTiO 3介电膜的镍屏/电介质/镍微放电器件的电(V-I)特性、辐射效率和寿命,这些器件的总厚度小至<100 μm,圆柱形微通道直径为50-150μm。    这些器件通过溶胶-凝胶工艺或胶体沉积制造,并在300至1200 Torr(300 K)的Ne气体压力下工作,其工作电压低至1093V(100 µm直径)。    BaTiO 3器件),并表现出优异的稳定性和寿命。在100小时的连续操作之后,在700Torr Ne(静态气体填充)和100 V下操作的Ni屏/30 μm BN/Ni装置产生其初始辐射输出的约98%。   
The electrical (V-I) characteristics, radiative efficiencies, and lifetimes of Ni screen/dielectric/Ni microdischarge devices, having overall thicknesses as small as <100 µm and cylindrical microchannels 50–150 µm in diameter, are investigated for Al2O3, BN, and BaTiO3 dielectric films that are 120 or 200 µm, 30 µm, and 5 µm in thickness, respectively. Having dielectrics fabricated by sol–gel processes or colloidal deposition and operated with Ne gas pressures between 300 and 1200 Torr (300K), these devices operate at voltages as low as ∼93 V (100 µm dia. BaTiO3 device), and exhibit exceptional stability and lifetimes. After 100 h of continuous operation, a Ni screen/30 µm BN/Ni device operating in 700 Torr Ne (static gas fill) at 100 V produces ∼98% of its initial radiant output.