A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material
A novel noria (water-wheel-like cyclic oligomer) derivative as a chemically amplified electron-beam resist material
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DOI：
10.1039/b805394d
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发表时间：
2008-01-01
影响因子：
--
通讯作者：
Ober, Christopher K.
中科院分区：
文献类型：
--
作者：
Kudo, Hiroto;Watanabe, Daisuke;Ober, Christopher K.
合成了一种新型的含叔丁基酯基团的梯形环状低聚物（分子水车诺里亚）衍生物。该衍生物（noria-（COOBU）-Bu-t）具有良好的热稳定性，在常用有机溶剂中溶解性好，成膜性好。在光酸产生剂的存在下检查noria-（COOBU）-Bu-t膜的光诱导脱保护（UV照射30分钟，然后在130 ℃下加热），并且发现叔丁基的脱保护顺利进行，得到相应的羧酸衍生物（noria-COOH）。此外，当将noria-（COOBU）-Bu-t（71）（叔丁基酯基团的比率：71%）作为电子束抗蚀剂材料进行研究时，在70 nm的分辨率下获得清晰的线和空间图案。
A novel ladder-type cyclic oligomer (molecular water-wheel noria) derivative containing t-butyl ester groups was synthesized. This derivative (noria-(COOBu)-Bu-t) had good thermal stability, good solubility in common organic solvents, and good film-forming ability. The photo-induced deprotection (UV irradiation for 30 min followed by heating at 130 degrees C) of films of noria-(COOBu)-Bu-t was examined in the presence of a photo-acid generator, and it was found that deprotection of the t-butyl groups proceeded smoothly to give the corresponding carboxylic acid derivative (noria-COOH). Furthermore, when noria-(COOBu)-Bu-t(71) (ratio of t-butyl ester groups: 71%) was examined as an electron-beam resist material, a clear line and space pattern was obtained at a resolution of 70 nm.