Properties of TiO2-based transparent conducting oxide thin films on GaN(0001) surfaces
Properties of TiO2-based transparent conducting oxide thin films on GaN(0001) surfaces
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DOI:
10.1063/1.3326943
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发表时间:
2010-03
影响因子:
3.2
通讯作者:
J. Kasai;T. Hitosugi;M. Moriyama;K. Goshonoo;N. L. H. Hoang;S. Nakao;N. Yamada;T. Hasegawa
中科院分区:
文献类型:
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作者:
J. Kasai;T. Hitosugi;M. Moriyama;K. Goshonoo;N. L. H. Hoang;S. Nakao;N. Yamada;T. Hasegawa
Anatase Nb-doped TiO2 transparent conducting oxide has been formed on GaN(0001) surfaces using a sputtering method. Amorphous films deposited at room temperature were annealed at a substrate temperature of 500 °C in vacuum to form single-phase anatase films. Films with a thickness of 170 nm exhibited a resistivity of 8×10−4 Ω cm with absorptance less than 5% at a wavelength of 460 nm. Furthermore, the refractive index of the Nb-doped TiO2 was well matched to that of GaN. These findings indicate that Nb-doped TiO2 is a promising material for use as transparent electrodes in GaN-based light emitting diodes (LEDs), particularly since reflection at the electrode/GaN boundary can be suppressed, enhancing the external quantum efficiency of blue LEDs.