Hideki Motomura: "Analysis for Chemical Bonds Formed on SiO_2 and Si_3N_4 Surfaces in C_4F_8 and C_5F_8 Plasmas for Selective Etching Processes"Extended Abstracts of International Workshop on Basic Aspects of Non-equilibrium Plasmas Interacting with Surfa
Hideki Motomura: "Analysis for Chemical Bonds Formed on SiO_2 and Si_3N_4 Surfaces in C_4F_8 and C_5F_8 Plasmas for Selective Etching Processes"Extended Abstracts of International Workshop on Basic Aspects of Non-equilibrium Plasmas Interacting with Surfa
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本村秀树：“Analysis for Chemical Bonds Formed on SiO_2 and Si_3N_4 Surfaces in C_4F_8 and C_5F_8 Plasmas for Selective Etching Processes”非平衡等离子体与表面相互作用基本方面国际研讨会扩展摘要
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