A Novel Low Temperature Curable Photosensitive Polybenzoxazole
A Novel Low Temperature Curable Photosensitive Polybenzoxazole
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一种新型低温固化光敏聚苯并恶唑
DOI：
10.1295/polymj.37.517
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发表时间：
2005
期刊：
影响因子：
2.8
通讯作者：
M. Ueda
中科院分区：
文献类型：
--
作者：
F. Toyokawa;Y. Shibasaki;M. Ueda
研制了一种新型低温环化正性光敏聚苯并恶唑。由4，4 ′-二羟基苯甲酸酯（PHA-6 F）制备基质聚合物（PHA-6 F）。双（六氟异亚丙基）邻氨基苯酚（6 FAP）和4，4 ′-氧代双（苯甲酰氯）（OBBC），并将光敏聚合物与PHA-6 F，溶解抑制剂1-{1，1-二[4-（2-重氮基-1-（2 H）萘酮-4-磺酰氧基）苯基]乙基}-4-{1-[4-（三氟甲基）苯基]-N-甲基-IH-吡唑-4-基}-IH-吡唑-4-甲酰胺（2-重氮基-1（2 H）萘酮-4-磺酰氧基）苯基]甲基乙基}苯（S-DNQ），和光-和热酸产生剂（5-丙基磺酰氧基亚氨基-5H-噻吩-2-亚基）-2-（甲基苯基）乙腈（PTMA）。2.4 μm厚的薄膜的感光度和对比度分别为15 mJ/cm ~ 2和2.5。当含有PHA-6 F、S-DNQ和PTMA（重量比为15：3：2）的2.1 μ m光敏膜在120 °C下预烘烤5 min，用365 nm光（60 mJ/cm 2）照射，用2.38 wt %的四甲基氢氧化铵（TMAH）溶液显影90 s，用乙酸洗涤，并在250 °C下固化10 min时，获得具有8 μm线和空间图案的清晰正性聚苯并恶唑图像。
A novel positive-tone photosensitive polybenzoxazole for low temperature cyclization has been developed. The matrix polymer (PHA-6F) was prepared from 4,4′-(hexafluoroisopropylidene)bis(o-aminophenol) (6FAP) and 4,4′-oxybis(benzoyl chloride) (OBBC) by low temperature solution polycondensation, and the photosensitive polymer was formulated with PHA-6F, a dissolution inhibitor 1-{1,1-bis[4-(2-diazo-1-(2H)naphthalenone-4-sulfonyloxy)phenyl]ethyl}-4-{1-[4-(2-diazo-1(2H)naphthalenone-4-sulfonyloxy)phenyl]methylethyl}benzene (S-DNQ), and a photo- and thermoacid generator (5-propylsulfonyloxyimino-5H-thiophen-2-ylidene)-2-(methylphenyl)acetonitrile (PTMA). The photosensitivity and contrast of the 2.4 μm thick film were 15 mJ/cm2 and 2.5, respectively. A clear positive polybenzoxazole image featuring 8 μm line-and-space pattern was obtained, when a 2.1 μm-photosensitive film containing PHA-6F, S-DNQ, and PTMA (15:3:2 in weight ratio) was prebaked at 120 °C for 5 min, irradiated with 365 nm light (60 mJ/cm2), developed with an 2.38 wt % tetramethylammonium hydroxide (TMAH) solution for 90 s, washed with acetic acid, and cured at 250 °C for 10 min.