Obtaining the structure factors for an epitaxial film using Cu X-ray radiation
Obtaining the structure factors for an epitaxial film using Cu X-ray radiation
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使用 Cu X 射线辐射获得外延膜的结构因子
DOI：
10.1107/s002188981302414x
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发表时间：
2013
影响因子：
6.1
通讯作者：
J. Rius
中科院分区：
文献类型：
--
作者：
P. Wadley;A. Crespi;J. Gázquez;M. Roldan;P. García;V. Novák;R. Campion;T. Jungwirth;C. Rinaldi;X. Marti;V. Holý;C. Frontera;J. Rius
用X射线衍射确定薄膜中原子的位置，目前是同步加速器装置的一项任务。这里提出了一种实验方法，使薄膜的结构因子振幅的测定使用实验室为基础的设备（铜Kα辐射）。 使用在GaAs衬底上生长的CuMnAs的外延130 nm膜测试该方法，其不同于正交体相形成具有四方对称性的晶体结构。 从一组结构因子模量通过应用这种方法，解决方案和细化的薄膜的晶体结构已成为可能。一致的高分辨率扫描透射电子显微镜和化学计量分析的结果支持。
Determining atomic positions in thin films by X-ray diffraction is, at present, a task reserved for synchrotron facilities. Here an experimental method is presented which enables the determination of the structure factor amplitudes of thin films using laboratory-based equipment (Cu Kα radiation). This method was tested using an epitaxial 130 nm film of CuMnAs grown on top of a GaAs substrate, which unlike the orthorhombic bulk phase forms a crystal structure with tetragonal symmetry. From the set of structure factor moduli obtained by applying this method, the solution and refinement of the crystal structure of the film has been possible. The results are supported by consistent high-resolution scanning transmission electron microscopy and stoichiometry analyses.