Kinetics of directed self-assembly of block copolymers on chemically patterned substrates
Kinetics of directed self-assembly of block copolymers on chemically patterned substrates
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DOI：
10.1088/1742-6596/640/1/012010
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发表时间：
2015-09
期刊：
影响因子：
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通讯作者：
M. Müller;Weihua Li;J. Rey;U. Welling
中科院分区：
文献类型：
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作者：
M. Müller;Weihua Li;J. Rey;U. Welling
化学图案表面已成功地用于指导嵌段共聚物的自组装动力学成密集的，周期性的形态（“化学外延”）。对于结构形成的动力学，特别是缺陷的形成和湮灭，已经做出了重大的努力。在目前的手稿中，我们使用计算机模拟软，粗粒聚合物模型来研究层状嵌段共聚物薄膜在线和空间的化学模式上的结构形成动力学。共聚物材料复制表面图案的情况和稀疏引导图案的更微妙的情况被考虑。我们的模拟结果突出了(1)模式导向自组装早期阶段的重要性，该阶段模板了随后的形态；(2)自由能景观对共聚物两个嵌段之间不相容的依赖。
Chemically patterned surfaces have been successfully employed to direct the kinetics of self-assembly of block copolymers into dense, periodic morphologies (”chemoepitaxy”). Significant efforts have been directed towards understanding the kinetics of structure formation and, particularly, the formation and annihilation of defects. In the present manuscript we use computer simulations of a soft, coarse-grained polymer model to study the kinetics of structure formation of lamellar-forming block copolymer thin films on a chemical pattern of lines and spaces. The case where the copolymer material replicates the surface pattern and the more subtle scenario of sparse guiding patterns are considered. Our simulation results highlight (1) the importance of the early stages of pattern-directed self-assembly that template the subsequent morphology and (2) the dependence of the free-energy landscape on the incompatibility between the two blocks of the copolymer.