Wave-optical analysis of submicron focus of hard x-ray beams by reflective optics
Wave-optical analysis of submicron focus of hard x-ray beams by reflective optics
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通过反射光学对硬 X 射线束的亚微米焦点进行波动光学分析
DOI：
10.1117/12.453752
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发表时间：
2002
期刊：
影响因子：
--
通讯作者：
Y. Mori
中科院分区：
文献类型：
--
作者：
K. Yamauchi;K. Yamamura;H. Mimura;Y. Sano;A. Saito;Masahiko Kanaoka;K. Endo;A. Souvorov;M. Yabashi;K. Tamasaku;T. Ishikawa;Y. Mori
使用镜面光学器件的聚焦方法在 X 射线显微镜领域得到了深入研究，因为镜面光学器件具有高光子效率和无色差等有用的特性。采用波动光学方法，我们研究了镜面形状误差的性质与聚焦 X 射线束的尺寸、强度和卫星峰结构等光学性能之间的关系。我们还评估了从焦点作为点源的球形发散光束的强度均匀性。获得的结果表明，需要前所未有的表面形状精度，例如在超过 0.5mm 的整个空间波长范围内高于 1nm，才能实现近衍射极限的聚焦，包括卫星结构和球面发散波前的强度平坦度。
Focusing methods using mirror optics are intensively studied in the field of X-ray microscopy because mirror optics has useful features such as high photon efficiency and no chromatic aberrations. Employing a wave-optical method, we investigated the relationship between the natures of figure errors on the mirror surface and optics performances such as sizes, intensities and satellite peak structures of the focused X-ray beam. We also evaluated uniformity of intensity in the spherically diverging beam from the focal point as a point source. Obtained results showed unprecedented degrees of surface figure accuracy such as higher than 1nm in all over the spatial wavelength range longer than 0.5mm was required to realize nearly diffraction-limited focusing including satellite structures and intensity flatness at the spherically diverging wavefront.