Modeling of profilometry with laser focus sensors
Modeling of profilometry with laser focus sensors
复制标题
使用激光聚焦传感器进行轮廓测量建模
DOI:
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发表时间:
2011
期刊:
影响因子:
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通讯作者:
H. Baitinger
中科院分区:
文献类型:
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作者:
J. Bischoff;E. Manske;H. Baitinger
Metrology is of paramount importance in submicron patterning. Particularly, line width and overlay have to be measured very accurately. Appropriated metrology techniques are scanning electron microscopy and optical scatterometry. The latter is non-invasive, highly accurate and enables optical cross sections of layer stacks but it requires periodic patterns. Scanning laser focus sensors are a viable alternative enabling the measurement of non-periodic features. Severe limitations are imposed by the diffraction limit determining the edge location accuracy. It will be shown that the accuracy can be greatly improved by means of rigorous modeling. To this end, a fully vectorial 2.5-dimensional model has been developed based on rigorous Maxwell solvers and combined with models for the scanning and various autofocus principles. The simulations are compared with experimental results. Moreover, the simulations are directly utilized to improve the edge location accuracy.