Influences of different diluents on NO emission characteristics of syngas opposed-flow flame

Influences of different diluents on NO emission characteristics of syngas opposed-flow flame
复制标题

DOI:
10.1016/j.ijhydene.2017.11.171
复制
发表时间:
2018-02-01
影响因子:
7.2
通讯作者:
Yan, Weiping
Yan, Weiping
中科院分区:
工程技术2区
文献类型:
--
作者:
He, Dong;Yan, Weiping

文献摘要

被引文献

相似文献

采用对流火焰模型和GRI 3.0机理分别研究了富氢和贫氢合成气在扩散和预混条件下的NO生成特性,并从热力学和反应动力学角度分析了添加H2O、CO2和N2对NO生成的影响。对于扩散火焰,热反应是NO生成的主要途径,添加N2-、H2O和CO2对NO生成的影响呈递减趋势。对于富氢合成气,由于其火焰温度较高,上述现象更为明显。对于预混火焰,加入CO2比加入H2O导致NO浓度升高,这是因为加入CO2产生更多的O自由基,通过NNH + O = NH + NO、NH + O = NO + H和反向N + NO = N2 + O促进NO的生成。在燃尽气中,热途径是NO生成的主要途径。在本文条件下,添加N2-在降低火焰温度的同时,增加了NO的生成源,总体上减少了NO的生成。另外,对于贫H2和富H2的合成气,以CO2为稀释剂时,N + CO2 = NO + CO在NO生成的热途径中起着重要作用。(C)2017年氢能出版有限责任公司。由爱思唯尔有限公司出版。保留所有权利。
This paper used the opposed-flow flame model and GRI 3.0 mechanism to investigate NO emission characteristics of H-2-rich and H-2-lean syngas under diffusion and premixed conditions, respectively, and analyzed influences of adding H2O, CO2 and N-2 on NO formation from the standpoint of thermodynamics and reaction kinetics. For diffusion flames, thermal route is the dominant pathway to produce NO, and adding N-2, H2O and CO2 shows a decreasing manner in lowering NO emission. The phenomenon above is more obvious for H-2-rich syngas because it has higher flame temperature. For premixed flames, adding CO2 causes higher NO concentration than adding H2O, because adding CO2 produces more O radical, which promotes formation of NO through NNH + O = NH + NO, NH + O = NO + H and reversed N + NO = N-2 + O. And in burnout gas, thermal route is the dominant way for NO formation. Under this paper's conditions, adding N-2 increases the formation source of NO as well as decreases the flame temperature, and it reduces the NO formation as a whole. In addition, for H2-lean syngas and H-2-rich syngas with CO2 as the diluent, N + CO2 = NO + CO plays as an important role in thermal route of NO formation. (C) 2017 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.