Achievement of an important milestone to realize the EUV-FEL high power light source for future lithograph
Achievement of an important milestone to realize the EUV-FEL high power light source for future lithograph
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实现未来光刻机EUV-FEL高功率光源的重要里程碑
DOI：
10.1117/12.2573121
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发表时间：
2020
期刊：
影响因子：
--
通讯作者：
H. Kawata
中科院分区：
文献类型：
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作者：
R. Kato;H. Sakai;K. Tsuchiya;Y. Tanimoto;Y. Honda;T. Miyajima;M. Shimada;N. Nakamura;H. Kawata
极紫外自由电子激光是未来大功率极紫外光源的理想光源之一。在自由电子激光光源设计研究取得进展的同时，最重要的一个里程碑应该是真实的演示高重复率ERL自由电子激光光源的产生。于2019财政年度，基于KEK紧凑型ERL的真实的中红外自由电子激光（MIR-FEL）项目启动，光束调试自2020年3月初开始。会上将介绍目前在中轨自由电子激光方面取得的成果，以及今后在极紫外自由电子激光方面的研究工作。
An EUV-FEL is one of the promising candidates for the future high power EUV light source of more than 1 kW. While the design study on the FEL light source has been progressed, a most important milestone should be a real demonstration of the high repetition rate ERL-based FEL light production. In FY2019, a real Mid-Infrared FEL (MIR-FEL) project based on the compact ERL in KEK started and the beam commissioning was started from the beginning of March 2020. At the conference, the present results obtained from the MIR-FEL and the expected remained-study-works on future EUV-FEL will be presented.