Grain boundary grooving and cathode voiding in bamboo-like metallic interconnects by surface drift diffusion under the capillary and electromigration forces
Grain boundary grooving and cathode voiding in bamboo-like metallic interconnects by surface drift diffusion under the capillary and electromigration forces
复制标题
在毛细管力和电迁移力下通过表面漂移扩散在竹状金属互连中形成晶界凹槽和阴极空洞
DOI:
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发表时间:
2005
期刊:
影响因子:
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通讯作者:
O. Akyildiz
中科院分区:
文献类型:
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作者:
T. Ogurtani;O. Akyildiz
The process of grain boundary (GB) grooving and cathode voiding in sandwich type thin film bamboo lines are simulated by introducing a mathematical model, which flows from the fundamental postulates of irreversible thermodynamics. In the absence of the electric field, the computer studies on the triple junction kinetics show that it obeys the first order reaction kinetics at early transient stage, which is followed by the familiar time law as t¯1∕4, at the steady state regime. The applied electric field (EF) in constant current experiments modifies this time law drastically above the well-defined electron wind intensity (EWI) threshold, and puts an upper limit for the groove depth, which decreases monotonically with EWI. Below the threshold level, the capillary regime predominates, and EF has little effect on the general kinetics of GB grooving, other than the linear increase in total elapsed time with EWI. An analytical formula for the cathode failure time in constant voltage test is obtained in terms of...