Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation
Study of effect annealing temperature on the structure, morphology and photocatalytic activity of Si doped TiO2 thin films deposited by electron beam evaporation
复制标题
退火温度对电子束蒸发沉积Si掺杂TiO2薄膜结构、形貌及光催化活性的影响研究
DOI：
10.1016/j.apsusc.2011.07.085
复制
发表时间：
2011-10-01
影响因子：
6.7
通讯作者：
Lu, Lude
中科院分区：
文献类型：
--
作者：
Lu, Zhongdan;Jiang, Xiaohong;Lu, Lude
采用电子束蒸发（EBE）法在石英玻璃上制备了Si掺杂的TiO 2透明薄膜（Si-TiO 2），并在空气气氛中进行了不同温度的退火处理。利用X射线衍射（XRD）、拉曼显微镜（拉曼）、X射线光电子能谱（XPS）和原子力显微镜（AFM）对薄膜的结构和形貌进行了分析。同时，以罗丹明B在水溶液中的降解程度为指标，评价了薄膜的光催化活性。实验结果表明，退火温度对Si-TiO 2薄膜的结构、形貌和光催化活性有很大影响。Si-TiO_2薄膜的热稳定性提高，提高了TiO_2由金红石型向金红石型的相变温度，提高了光催化效率。(C)2011年爱思唯尔B。V.保留所有权利。
Transparent Si-doped TiO2 thin films (Si-TiO2) were deposited on quartz glasses using electron beam evaporation (EBE) and annealed at different temperature in an air atmosphere. The structure and morphology of these films were analyzed by X-ray diffraction (XRD), Raman microscopy (Raman), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Meanwhile the photocatalytic activity of the films has also been evaluated on the basis of the degradation degree of rhodamine B in aqueous solution. Our experimental results suggest that the annealing temperature impact a strong effect on the structure, morphology and photocatalytic activity of Si-TiO2 thin films. Furthermore the enhanced thermal stability of Si-TiO2 films enabled them to elevate the phase transformation temperature of TiO2 from anatase to rutile and enhanced the photocatalytic efficiency. (C) 2011 Elsevier B. V. All rights reserved.