Controlling the number of excited atoms flowing into the reaction chamber using pulse-modulated induction thermal plasmas at atmospheric pressure

Controlling the number of excited atoms flowing into the reaction chamber using pulse-modulated induction thermal plasmas at atmospheric pressure
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DOI:
10.1088/0963-0252/16/2/010
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发表时间:
2007-05
影响因子:
3.8
通讯作者:
Yasunori Tanaka;Y. Uesugi;T. Sakuta
Yasunori Tanaka;Y. Uesugi;T. Sakuta
中科院分区:
物理与天体物理1区
文献类型:
--
作者:
Yasunori Tanaka;Y. Uesugi;T. Sakuta

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研究了大气压下Ar脉冲调制感应热等离子体(PMITP)中分子气体激发态原子数的控制。这种控制在促进热等离子体处理中的衬底表面的改性方面是重要的。通过设置用作高频电源的逆变器电源中的金属氧化物半导体场效应晶体管的触发角来调制维持PMITP所需的线圈电流。使用光学发射光谱技术测量激发原子线的辐射强度,以估计流入反应室的激发原子的数量。特别是,我们发现了作为线圈电流的脉冲调制的结果,在Ar或Ar-H2 PMITPs中流入反应室的激发的Ar和H原子的数量增加。
Controlling the number of excited atoms into a reaction chamber was investigated in Ar pulse-modulated induction thermal plasma (PMITP) with molecular gases at atmospheric pressure. Such control is important in promoting the modification of substrate surfaces in thermal plasma processing. The coil current required for sustaining a PMITP was modulated by setting the firing angle of the metal-oxide-semiconductor field-effect transistor in the inverter power supply used as a high-frequency power source. The radiation intensities of the excited atomic lines were measured using the optical emission spectroscopy technique to estimate the number of excited atoms flowing into the reaction chamber. In particular, we found an increase in the number of excited Ar and H atoms flowing into the reaction chamber in Ar or Ar–H2 PMITPs as a result of the pulse modulation of the coil current.