Controlling the number of excited atoms flowing into the reaction chamber using pulse-modulated induction thermal plasmas at atmospheric pressure
Controlling the number of excited atoms flowing into the reaction chamber using pulse-modulated induction thermal plasmas at atmospheric pressure
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DOI:
10.1088/0963-0252/16/2/010
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发表时间:
2007-05
影响因子:
3.8
通讯作者:
Yasunori Tanaka;Y. Uesugi;T. Sakuta
中科院分区:
文献类型:
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作者:
Yasunori Tanaka;Y. Uesugi;T. Sakuta
Controlling the number of excited atoms into a reaction chamber was investigated in Ar pulse-modulated induction thermal plasma (PMITP) with molecular gases at atmospheric pressure. Such control is important in promoting the modification of substrate surfaces in thermal plasma processing. The coil current required for sustaining a PMITP was modulated by setting the firing angle of the metal-oxide-semiconductor field-effect transistor in the inverter power supply used as a high-frequency power source. The radiation intensities of the excited atomic lines were measured using the optical emission spectroscopy technique to estimate the number of excited atoms flowing into the reaction chamber. In particular, we found an increase in the number of excited Ar and H atoms flowing into the reaction chamber in Ar or Ar–H2 PMITPs as a result of the pulse modulation of the coil current.