Nanostructured superhard films as typical nanomaterials
Nanostructured superhard films as typical nanomaterials
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DOI：
10.1016/j.surfcoat.2006.08.119
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发表时间：
2007-03
影响因子：
5.4
通讯作者：
R. Andrievski
中科院分区：
文献类型：
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作者：
R. Andrievski
表征了使用薄膜样品进行纳米材料科学研究的优势。特别是，纳米颗粒结构很容易在薄膜样品中获得，而在块状样品中很难获得。详细介绍和讨论了超硬多层氮化物薄膜的性能，包括TiN和TiB2薄膜在压痕过程中的变形，外加磁场对(TiB_2-B_4C)薄膜纳米结构和显微硬度的影响，以及TiN薄膜的电磁场性能。结果表明，除两层互溶外，氮化多层膜的显微硬度一般都随层数的增加而增加。180层TiN/NbN薄膜的显微硬度为78 Gpa。TiB2薄膜在压痕下具有不均匀的阶梯状变形模式，而TiN薄膜具有均匀的变形模式，这可能是由于沿柱状晶界的滑移所致。在磁控溅射沉积过程中施加外加磁场提高了晶态和非晶态(TiB_2-B_4C)薄膜的硬度和平整度。减小TiN薄膜的颗粒尺寸，在保持载流子密度不变的情况下，降低了电子迁移率。在TiN薄膜中，氧和碳的分布可以认为是随机的，其颗粒尺寸间隔为10-30 nm。
The advantages of the use of film samples for nanomaterials science studies are characterized. In particular, nanograined structures are readily obtained in film samples, whereas they are difficult to obtain in bulk samples. The properties of superhard multilayer nitride films, including the deformation of TiN and TiB2films during indentation, the effect of an additional external magnetic field on the (TiB2–B4C) films' nanostructure and microhardness, as well as galvanomagnetic properties of TiN films are described and discussed in detail. It was found that generally the microhardness of multilayer nitride films increased with the number of layers, except if the two layers mutually dissolved. A microhardness of 78 GPa was achieved in 180 layer TiN/NbN films. TiB2films had an inhomogeneous step-like deformation pattern under indentation, in contrast to TiN films, which had a homogeneous deformation pattern, probably due to a slip along columnar grain boundaries. Application of an additional external magnetic field during magnetron sputter deposition increased hardness and smoothness of both crystalline and amorphous (TiB2–B4C) films. Decreasing the grain size of TiN films decreased the electron mobility while maintaining the carrier density. The oxygen and carbon distribution can be considered as random in TiN films with the grain size interval of 10–30 nm.