Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing
Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing
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DOI:
10.1016/j.apmt.2023.102033
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发表时间:
2024-02
影响因子:
8.3
通讯作者:
A. Frechilla;M. Napari;N. Strkalj;Eduardo Barriuso;Kham Niang;Markus Hellenbrand;Pavel Strichovanec;F. Simanjuntak;Guillermo Antorrena;Andrew Flewitt;C. Magén;Germán F. de la Fuente;J. MacManus‐Driscoll;L. Angurel;José A. Pardo
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文献类型:
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作者:
A. Frechilla;M. Napari;N. Strkalj;Eduardo Barriuso;Kham Niang;Markus Hellenbrand;Pavel Strichovanec;F. Simanjuntak;Guillermo Antorrena;Andrew Flewitt;C. Magén;Germán F. de la Fuente;J. MacManus‐Driscoll;L. Angurel;José A. Pardo
In this work we study the sub-nanosecond laser-induced crystallization of 10 nm-thick atomic layer deposited amorphous Hf0.5Zr0.5O2(HZO) films in an air atmosphere. We used an infrared laser with 1064 nm wavelength and 800 ps pulses to anneal TiN/HZO/TiN capacitors by scanning an 80 μm-diameter spot along their top surface in a controlled way. The laser annealing process was optimised in terms of fluence to achieve the complete crystallization of HZO into a non-monoclinic polymorph, as demonstrated by X-ray diffraction and transmission electron microscopy. Piezoresponse force microscopy and polarization-field loops confirm that the optimal as-annealed HZO films are piezoelectric and ferroelectric from the first cycle on. Spatial selectivity was accomplished by scanning the laser on selected areas of the samples. Micro-diffraction experiments show that the transition between the crystallized and the amorphous region is abrupt within a distance of several hundred µm.