High-throughput synthesis of Mo-Nb-Ta-W high-entropy alloys via additive manufacturing
High-throughput synthesis of Mo-Nb-Ta-W high-entropy alloys via additive manufacturing
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DOI：
10.1016/j.matdes.2019.108358
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发表时间：
2020-02-01
影响因子：
8.4
通讯作者：
Couet, Adrien
中科院分区：
文献类型：
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作者：
Moorehead, Michael;Bertsch, Kaila;Couet, Adrien
高熵合金（HEAs）是一类具有良好性能的合金，包括增强的耐辐照性、高温强度和耐腐蚀性。然而，它们存在于一个相对未被探索的准无限合成空间区域。因此，为了能够开发有前景的组成复杂的合金，如HEAs，需要高通量方法。这种高通量的能力，开发和提出在这项工作中。采用通过增材制造的原位合金化来产生不同HEA组合物的阵列。然后通过扫描电子显微镜（SEM）、能量色散X射线光谱（EDS）和X射线衍射（XRD）来表征样品阵列，所有这些都保留在构建板上。每个样品的顶表面是组成均匀的，如通过EDS测定的，并且每个样品表现出单相、无序晶体结构，如通过XRD测定的。采用相图计算（CALPHAD）模型确定了各HEA组分在较低温度下的平衡相，并与XRD结果进行了比较。高通量的合成技术和耦合的高通量的表征和建模技术的影响进行了讨论的合金开发的背景下。(C)2019作者爱思唯尔有限公司出版
High-entropy alloys (HEAs) are a class of alloys that can exhibit promising properties including enhanced irradiation resistance, high-temperature strength, and corrosion resistance. However, they exist in a relatively unexplored region of quasi-limitless composition space. Thus, to enable the development of promising compositionally complex alloys, such as HEAs, high-throughput methods are needed. Such high-throughput capabilities are developed and presented in this work. In situ alloying through additive manufacturing was employed to produce arrays of different HEA compositions. Sample arrays were then characterized by scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), and X-ray diffraction (XRD), all while remaining on the build plate. The top surface of each sample was compositionally homogeneous, as determined by EDS, and each sample exhibited a single-phase, disordered crystal structure, as determined by XRD. CALculation of PHAse Diagrams (CALPHAD) modeling was used to determine the equilibrium phases of each HEA composition at lower temperatures, the results of which were compared with XRD results. Implications of high-throughput synthesis techniques and the coupling of high-throughput characterization and modeling techniques are discussed in the context of alloy development. (C) 2019 The Authors. Published by Elsevier Ltd.