Highly accurate differential deposition for X-ray reflective optics
Highly accurate differential deposition for X-ray reflective optics
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DOI：
10.1002/sia.2812
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发表时间：
2008-06-01
影响因子：
1.7
通讯作者：
Yamauchi, Kazuto
中科院分区：
文献类型：
--
作者：
Handa, Soichiro;Mimura, Hidekazu;Yamauchi, Kazuto
我们开发了一套用于制造X射线光学器件的高精度差分沉积系统。利用该系统，可以在基片表面制备出厚度分布沿纵向逐渐变化的薄膜，精度为亚纳米级。原子力显微镜观察表明，沉积的薄膜表面平整，可以防止X射线在镜面上的散射。在100 mm长的衬底上成功地沉积了具有所需厚度分布的铂薄膜。版权所有(C)2008 John Wiley&Sons，Ltd.
We have developed a highly accurate differential deposition system for the fabrication of X-ray optical devices. Using this system, thin films having a thickness distribution gradually changing along the longitudinal direction on a substrate surface could be produced with sub-nanometer accuracy. The surface flatness of the deposited films was confirmed by atomic force microscopy observation, and the surface was sufficiently smooth to prevent X-ray scattering on the mirror surface. A demonstration of differential deposition was performed and a Pt thin film having the desired thickness profile was successfully deposited on a 100 mm long substrate. Copyright (C) 2008 John Wiley & Sons, Ltd.