Hydrogen incorporation into tungsten deposits growing by hydrogen plasma sputtering
Hydrogen incorporation into tungsten deposits growing by hydrogen plasma sputtering
复制标题
通过氢等离子体溅射将氢掺入到生长的钨沉积物中
DOI：
10.1016/j.fusengdes.2015.11.057
复制
发表时间：
2016
影响因子：
1.7
通讯作者：
S. Fukada
中科院分区：
文献类型：
--
作者：
K. Katayama;M. Noguchi;H. Date;S. Fukada
从聚变堆氚经济性和氚安全性的角度出发，了解钨沉积物中的氢积累行为是非常重要的。有报道指出，大量的氢同位素掺入到钨沉积物生长的氢等离子体溅射。然而，氢掺入的机制还不清楚。在这项工作中，钨沉积物形成在不同的情况下，在溅射设备和掺入的氢的量进行了测量。从溅射靶反射的氢注入主要贡献于氢掺入。在实验条件下，来自等离子体的活性氢注入的贡献小于反射氢注入的贡献。甚至在溅射靶的阴影区域中也形成了可检测量的钨沉积物。这表明一定量的钨原子由于与氢分子碰撞而失去了初始能量，在气相中扩散并附着在阴影区。
Understanding of hydrogen accumulation behavior in tungsten deposits is important from viewpoints of tritium economy and tritium safety in fusion reactors. Some reports indicate that a large amount of hydrogen isotope is incorporated into tungsten deposits growing by hydrogen plasma sputtering. However, the mechanism of hydrogen incorporation is not clarified yet. In this work, tungsten deposits were formed at different circumstances in the sputtering device and the amount of incorporated hydrogen was measured. The implantation of hydrogen reflected from the sputtering target was mainly contributed to the hydrogen incorporation. The contribution of the implantation of reactive hydrogen from plasma was smaller than that of the reflected hydrogen in the experimental condition. A detectable amount of tungsten deposits was formed even in the shadow region from the sputtering target. This suggests that a certain amount of tungsten atoms, which lost its initial energy by collision with molecular hydrogen, diffuses in the gas phase and adheres in the shadow region.