Silicon nitride nanosieve membrane
Silicon nitride nanosieve membrane
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DOI：
10.1021/nl0350175
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发表时间：
2004-02-01
期刊：
影响因子：
10.8
通讯作者：
Elwenspoek, M
中科院分区：
文献类型：
--
作者：
Tong, HD;Jansen, HV;Elwenspoek, M
采用聚焦离子束（FIB）刻蚀技术，在微机械氮化硅膜上制备了一系列孔径为25 nm的均匀圆柱形纳米孔。通过用另一氮化硅层涂覆该纳米筛膜，将该纳米筛膜的孔径进一步减小至低于10 nm。这种纳米筛膜具有足够的机械强度，可达到几巴的跨膜压力，并且可以承受高达900摄氏度的高温。此外，它对许多腐蚀性化学品呈惰性，如热浓氢氧化钾（KOH）、食人鱼（H2SO4 + H2O2）和硝酸（HNO3）。
An array of very uniform cylindrical nanopores with a pore diameter as small as 25 nm has been fabricated in an ultrathin micromachined silicon nitride membrane using focused ion beam (FIB) etching. The pore size of this nanosieve membrane was further reduced to below 10 nm by coating it with another silicon nitride layer. This nanosieve membrane possesses adequate mechanical strength up to several bars of transmembrane pressure, and it can withstand high temperatures up to 900 degreesC. In addition, it is inert to many aggressive chemicals such as hot concentrated potassium hydroxide (KOH), piranha (H2SO4 + H2O2), and nitric acid (HNO3).