Fabrication of defrost films using graphenes grown by chemical vapor deposition

Fabrication of defrost films using graphenes grown by chemical vapor deposition
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DOI:
10.1016/j.cap.2012.05.012
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发表时间:
2012-01-01
影响因子:
2.4
通讯作者:
Jeong, Goo-Hwan
Jeong, Goo-Hwan
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Lee, Byeong-Joo;Jeong, Goo-Hwan

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我们演示了使用石墨烯基透明导电膜(TCF)制造除霜膜。采用甲烷源化学气相沉积法在镍薄膜上催化合成石墨烯,并将其转移到玻璃或柔性聚合物基板上。制造的石墨烯基 TCF 在可见光范围内表现出超过 85% 的中等透射率和 750 Ω/sq 的低薄层电阻。具有高可靠性。我们测量了用作除霜膜的恒定或循环电压应用导致的膜的加热响应。在40 V的施加下,薄膜的最高温度升高至80℃,并且薄膜在24小时内表现出较高的热稳定性。最后,我们证实,在施加30V电压的情况下,石墨烯基TCF表面形成的霜可以在30秒内清晰去除。结果表明,石墨烯基TCF作为除霜膜在许多领域具有很高的可行性。 (c) 2012 Elsevier B.V. 保留所有权利。
We demonstrate the fabrication of defrost films using graphene-based transparent conductive films (TCF). The graphene was catalytically synthesized on Ni thin film using chemical vapor deposition method with methane source and transferred onto glass or flexible polymeric substrates. The fabricated graphene-based TCF showed moderate transmittance over 85% in visible range and low sheet resistance of 750 Omega/sq. with high reliability. We measured heating response of the films as a result of constant or cyclic voltage application to use as defrost films. The maximum temperature of the films increased up to 80 degrees C under the application of 40 V and the films showed high heating stability for 24 h. Finally, we confirmed that the frost formed on the surface of the graphene-based TCF can be clearly removed within 30 s under the application of 30 V. The results show high feasibility of the graphene-based TCF as defrost films in many areas. (c) 2012 Elsevier B.V. All rights reserved.