Ultrathin Wetting Layer-Free Plasmonic Gold Films
Ultrathin Wetting Layer-Free Plasmonic Gold Films
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DOI：
10.1021/acsphotonics.9b00907
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发表时间：
2019-10
期刊：
影响因子：
7
通讯作者：
R. Lemasters;Cheng Zhang;M. Manjare;Wenqi Zhu;Junyeob Song;S. Urazhdin;H. Lezec;A. Agrawal;
中科院分区：
文献类型：
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作者：
R. Lemasters;Cheng Zhang;M. Manjare;Wenqi Zhu;Junyeob Song;S. Urazhdin;H. Lezec;A. Agrawal;
超薄金薄膜由于其有用的光学和光电特性，对等离子体和超材料器件很有吸引力。然而，沉积几纳米厚度的超薄连续金薄膜具有挑战性，通常需要润湿层，导致光学损耗增加且不符合光电器件要求。我们展示了通过沉积在冷却至低温的基板上获得的厚度低至 3 nm 的润湿无层等离子体金膜。我们系统地研究了基底温度对沉积金薄膜性能的影响，结果表明基底冷却抑制了金的 Volmer-Weber 生长模式，促进了连续金薄膜的早期形成，具有改善的表面形貌和增强的光电性能。我们的研究结果为直接实现超薄金基光电和等离子体器件以及超材料和超表面铺平了道路。
Ultrathin gold films are attractive for plasmonic and metamaterial devices, thanks to their useful optical and optoelectronic properties. However, deposition of ultrathin continuous Au films of a few nanometer thickness is challenging and generally requires wetting layers, resulting in increased optical losses and incompatibility with optoelectronic device requirements. We demonstrate wetting layer-free plasmonic gold films with thicknesses down to 3 nm obtained by deposition on substrates cooled to cryogenic temperatures. We systematically study the effect of substrate temperature on the properties of the deposited Au films and show that substrate cooling suppresses the Volmer−Weber growth mode of Au, promoting early stage formation of continuous Au films with improved surface morphology and enhanced optoelectronic properties. Our results pave the way for straightforward implementation of ultrathin Au-based optoelectronic and plasmonic devices, as well as metamaterials and metasurfaces.