Sustainable Electrodeposition of ZnO by a Galvanic Contact Method
Sustainable Electrodeposition of ZnO by a Galvanic Contact Method
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DOI：
10.1149/1.3168518
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发表时间：
2009-09
影响因子：
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通讯作者：
T. Shinagawa;K. Murase;M. Izaki
中科院分区：
文献类型：
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作者：
T. Shinagawa;K. Murase;M. Izaki
将导电基体与Zn棒短路后浸入氧饱和的Zn（ClO4）2水溶液中进行电接触沉积ZnO，并与Zn（NO3）2中的电接触沉积进行了比较. Zn棒在Zn（ClO 4）2溶液中的溶解向衬底提供了连续且几乎恒定的电流，从而允许在没有外部电源和副产物的情况下阴极电沉积ZnO。所得ZnO的形貌取决于Zn（ClO4）2的浓度。相反，在Zn（NO3）2溶液中观察到小得多的电流，并且几乎没有ZnO沉积。
The galvanic contact deposition of ZnO was carried out by immersing a conductive substrate short-circuited with a Zn rod into O 2 -saturated aqueous Zn(ClO 4 ) 2 solutions, and the deposition behaviors were investigated in comparison with that in Zn(NO 3 ) 2 . The dissolution of the Zn rod in the Zn(ClO 4 ) 2 solutions supplied a continuous and almost constant current to the substrate, allowing the cathodic electrodeposition of ZnO without an external power and by-products. The morphology of the resulting ZnO depended on the Zn(ClO 4 ) 2 concentration. In contrast, a much smaller current was observed in the Zn(NO 3 ) 2 solution, and little ZnO was deposited.