Significant improvement of the short-term high-temperature oxidation resistance of dense monolithic HfC/SiC ceramic nanocomposites upon incorporation of Ta
Significant improvement of the short-term high-temperature oxidation resistance of dense monolithic HfC/SiC ceramic nanocomposites upon incorporation of Ta
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DOI：
10.1016/j.corsci.2018.10.005
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发表时间：
2018-12-01
影响因子：
8.3
通讯作者：
Ionescu, Emanuel
中科院分区：
文献类型：
--
作者：
Wen, Qingbo;Riedel, Ralf;Ionescu, Emanuel
介绍并讨论了致密单片 (Hf,Ta)C/SiC 基陶瓷纳米复合材料在 1200 至 1500 摄氏度温度下的短期氧化（即暴露时间长达 20 小时）。 HfC/SiC的氧化行为与其他UHTCs相似，表明其主要由HfC相决定。 Ta 掺入 HfC 会导致抛物线氧化速率大幅降低（3-4 个数量级）。与HfC/SiC不同，含Ta纳米复合材料形成由HfO2、Ta2O5和Hf6Ta2O17组成的连续多相鳞片，这些鳞片能够在氧化过程中快速致密化。
The short-term oxidation (i.e., exposure time of up to 20 h) of dense monolithic (Hf,Ta)C/SiC-based ceramic nanocomposites at temperatures from 1200 to 1500 degrees C is presented and discussed. The oxidation behavior of HfC/SiC is similar to that of other UHTCs, indicating that it is mainly determined by the HfC phase. Ta incorporation into HfC leads to a strong decrease of the parabolic oxidation rates (3-4 orders of magnitude). Unlike HfC/SiC, Ta-containing nanocomposites form continuous multiphasic scales consisting of HfO2, Ta2O5 and Hf6Ta2O17, which are able to densify quickly during the oxidation process.