Effect of Phantom Dark Energy on Holographic Thermalization

Effect of Phantom Dark Energy on Holographic Thermalization
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幻影暗能量对全息热化的影响

DOI:
10.1088/0256-307x/34/1/010401
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发表时间:
2015-03
影响因子:
3.5
通讯作者:
Li Li-Fang
Li Li-Fang
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Zeng Xiao-Xiong;Hu Xin-Yun;Li Li-Fang

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研究了被幻影暗能量包围的黑洞的全息热化。结果表明,当化学势一定时,模型暗能量参数越小,等离子体越容易热化;当暗能量参数一定时,化学势越大,等离子体越难热化。通过对热化曲线的拟合,给出了热化速度和热化加速度。
Holographic thermalization for a black hole surrounded by phantom dark energy is probed. The result shows that the smaller the phantom dark energy parameter is, the easier the is plasma to thermalize as the chemical potential is fixed, the larger the chemical potential is, and the harder the plasma is to thermalize as the dark energy parameter is fixed. The thermalization velocity and thermalization acceleration are presented by fitting the thermalization curves.
具有德西特边界的高斯-邦内重力中的全息热化
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