Four beams surface plasmon interference nanoscale lithography for patterning of two-dimensional periodic features
Four beams surface plasmon interference nanoscale lithography for patterning of two-dimensional periodic features
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DOI：
10.1116/1.3276702
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发表时间：
2010-01
期刊：
影响因子：
--
通讯作者：
K. V. Sreekanth;V. M. Murukeshan
中科院分区：
文献类型：
--
作者：
K. V. Sreekanth;V. M. Murukeshan
本文提出并说明了多重反向传播表面等离子体波的干涉作为一种光刻技术来图案化周期性二维特征。表面等离子体激元是通过棱镜耦合方法、采用定制的棱镜层配置和单次曝光产生的。使用364nm波长的曝光辐射实现了175nm周期性二维点阵列图案，其特征尺寸小至93nm。
The interference of multiple counterpropagating surface plasmon waves as a lithography technique to pattern periodic two-dimensional features is proposed and illustrated in this article. The surface plasmons are generated by prism coupling method, by employing a custom made prism layer configuration and with a single exposure. 175nm periodic two-dimensional dot array patterns, with feature size as small as 93nm, have been realized using an exposure radiation of 364nm wavelength.