Growth of Lu2O3 and HfO2 based high melting temperature single crystals by indirect heating method using arc plasma
Growth of Lu2O3 and HfO2 based high melting temperature single crystals by indirect heating method using arc plasma
复制标题
电弧等离子体间接加热法生长Lu2O3和HfO2基高熔点单晶
DOI：
10.3390/cryst10070619
复制
发表时间：
2020
期刊：
影响因子：
2.7
通讯作者：
Akira Yoshikawa
中科院分区：
文献类型：
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作者：
Kyoung Jin Kim;Kei Kamada;Rikito Murakami;Takahito Horiai;Shiori Ishikawa;Vladimir Kochurikhin;Masao Yoshino;Akihiro Yamaji;Yasuhiro Shoji;Shunsuke Kurosawa;Satoshi Toyoda;Hiroki Sato;Yuui Yokota;Yuji Ohashi;Akira Yoshikawa
