Simulation of a mirror corrector for PEEM3
Simulation of a mirror corrector for PEEM3
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DOI：
10.1016/j.nima.2003.11.159
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发表时间：
2004-02-21
影响因子：
1.4
通讯作者：
Robin, DS
中科院分区：
文献类型：
--
作者：
Wan, W;Feng, J;Robin, DS
第三代像差校正的光电发射电子显微镜正在设计中的先进光源。电子镜用于校正最低阶球面像差和色差。采用有限元法和光线追迹法以及电荷环法和微分代数法这两种不同的方法来模拟静电场和电子束的行为。这两种方法之间已经取得了很好的一致性，并且已经发现四极镜可以有效地校正球差和色差。在20 kV下工作，100%透射的点分辨率达到50 nm，与没有校正的440 nm相比有显著降低。在2%透射率下实现的最高分辨率为4 nm，而在1%透射率下未校正时为20 nm。(C)2003 Elsevier B.V.保留所有权利。
A third generation aberration-corrected Photoernission Electron Microscope is being designed at the Advanced Light Source. An electron mirror is used for the correction of the lowest order spherical and chromatic aberrations. Two very different methods, one using finite-element method and ray-tracing technique and the other using charge ring method and differential algebra technique, have been employed to simulate the electrostatic field and the behavior of the electron beam. Good agreement has been obtained between the two methods and a tetrode mirror has been found to effectively correct the spherical and chromatic aberrations. Operating at 20 kV, the point resolution for 100% transmission reaches 50 nm with the mirror corrector, a significant reduction from that of 440 nm without correction. The highest resolution achieved is 4 nm at 2% transmission, as opposed to 20 nm at 1% transmission without correction. (C) 2003 Elsevier B.V. All rights reserved.