Grain boundary networks in Y123 coated conductors: Formation, properties and simulation
Grain boundary networks in Y123 coated conductors: Formation, properties and simulation
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Y123 涂层导体中的晶界网络：形成、特性和模拟
DOI：
10.1109/77.919911
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发表时间：
2001
期刊：
影响因子：
--
通讯作者：
W. Prusseit
中科院分区：
文献类型：
--
作者：
B. Holzapfel;L. Fernández;F. Schindler;B. D. Boer;N. Reger;J. Eickemeyer;P. Berberich;W. Prusseit
双轴织构YBa/sub 2/Cu/sub 3/O/sub x/ (Y123)涂层导体的晶界（GB）网络是决定其输运性能的关键，并决定了临界电流密度的上限。在这篇文章中，我们详细报道了EBSD（电子后向散射衍射）对沉积在高度双轴纹理金属衬底上的Y123薄膜中这些GB网络形成的研究，并将测量到的临界电流密度与基于底层GB网络精确知识的模拟进行了比较。采用轧制和再结晶法制备了高度立方织构的ni带，并利用EBSD对Y123薄膜热蒸发和脉冲激光沉积前后的织构图进行了详细的测定。这样可以定量评价y123在不同取向ni晶粒上的生长和决定临界电流密度的GB错取向网络。这种精确的纹理信息也被用于计算临界电流密度，该密度基于众所周知的指数j/sub c/-依赖于Y123倾斜gb，并与在相同衬底区域上测量的传输j/sub c/进行比较。
The grain boundary (GB) network in biaxially textured YBa/sub 2/Cu/sub 3/O/sub x/ (Y123) coated conductors is the key to their transport properties and determines the upper limit for the critical current density. In this contribution we report on detailed EBSD (electron backscattering diffraction) investigations of the formation of these GB networks in Y123 films deposited on highly biaxially textured metallic substrates and the comparison of the measured critical current density with simulations based on the exact knowledge of the underlying GB network. Highly cube textured Ni-tapes were prepared by rolling and recrystallization and detailed texture maps were determined by EBSD before and after the deposition of Y123 films by thermal evaporation or pulsed laser deposition. This allowed the quantitative evaluation of both the Y123-growth on different oriented Ni-grains and the GB misorientation network which determines the critical current density. This exact texture information was also used to calculate the critical current density based on the well known exponential j/sub c/-dependence across Y123 tilt GBs and is compared to the measured transport j/sub c/ across the same substrate area.