Local chemical states and thermal stabilities of nitrogen dopants in ZnO film studied by temperature-dependent x-ray photoelectron spectroscopy
Local chemical states and thermal stabilities of nitrogen dopants in ZnO film studied by temperature-dependent x-ray photoelectron spectroscopy
复制标题
温度依赖性 X 射线光电子能谱研究 ZnO 薄膜中氮掺杂剂的局部化学态和热稳定性
DOI：
10.1063/1.3259644
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发表时间：
2009-11-09
影响因子：
4
通讯作者：
Lu, Y. M.
中科院分区：
文献类型：
--
作者：
Li, X. H.;Xu, H. Y.;Lu, Y. M.
Local chemical states and thermal stabilities of N dopants in ZnO-N film are investigated by temperature-dependent x-ray photoelectron spectroscopy. Different types of N local states are detected, including N(2) Molecules occupying O sites [(N(2))(O)], -NO species, substitutional N atoms in O- and N-rich local environments (alpha- and beta-N(O)). Compared to the beta-N(O), the alpha-N(O) shows a better thermal stability up to 723 K. However, the transformation from alpha-N(O) acceptor 10 undesirable (N(2))(O) donor occurs above 743 K. The variation of N local states also affects Zn and O binding energies. Photoluminescence studies indicate the shallow acceptor nature of alpha-N(O). (C) 2009 American Institute of Physics. [doi 10.1063/1.3259644]
