Freestanding submillimetre wave FSS technology
Freestanding submillimetre wave FSS technology
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独立式亚毫米波 FSS 技术
DOI：
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发表时间：
2011
期刊：
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通讯作者：
N. Mitchell
中科院分区：
文献类型：
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作者：
R. Dickie;R. Cahill;V. Fusco;N. Mitchell
在本文中，我们报告的两种方法制造的频率选择表面（FSS）的目的是给一个偏振无关的带通滤波器的响应集中在321 GHz。其中一种设计是基于金属封装聚合物，而后来的版本使用绝缘体上硅（SOI）作为结构材料。在洁净室实验室中使用精密微机械加工和电镀工艺进行器件的制造。其中包括使用反应离子蚀刻（RIE）来图案化各个槽，以及使用深RIE来去除下面的衬底。该过程产生独立式FSS，其可以被复制以形成具有增强的过滤性能的多层结构。在290 GHz - 360 GHz范围内的准光传输测量产生的光谱传输系数与数值预测密切一致。
In this paper we report on two methods of fabricating Frequency Selective Surfaces (FSS) which are designed to give a polarisation independent band pass filter response centred at 321 GHz. One of the designs is based on metal encapsulated polymer while a later version uses silicon on insulator (SOI) as the structural material. The fabrication of the devices was carried out in a clean room laboratory using precision micromachining and plating processes. These include the use of reactive ion etching (RIE) to pattern the individual slots and deep RIE to remove the substrate underneath. This process yields a Freestanding FSS which can be duplicated to form multilayer structures with enhanced filtering performance. Quasi-optical transmission measurements in the 290 GHz – 360 GHz range yield spectral transmission coefficients which are in close agreement with the numerical predictions.