Spatial beam intensity shaping using phase masks on single-mode optical fibers fabricated by femtosecond direct laser writing
Spatial beam intensity shaping using phase masks on single-mode optical fibers fabricated by femtosecond direct laser writing
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DOI：
10.1364/optica.3.000448
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发表时间：
2016-04-20
期刊：
影响因子：
10.4
通讯作者：
Giessen, Harald
中科院分区：
文献类型：
--
作者：
Gissibl, Timo;Schmid, Michael;Giessen, Harald
亚微米介电相位掩模允许实现高质量光学元件的小型化。在这封信中，我们展示了空间强度光束整形使用相位掩模连接到光学单模光纤。利用飞秒双光子激光直写技术将相位掩模直接制作在光纤端面上，实现了亚微米级的对准精度。我们观察到高质量的强度模式，并找到与模拟非常一致。我们的研究结果证明，衍射微光学器件的3D打印可以实现足够的性能，以实现紧凑的设备。(C)2016美国光学学会
Submicrometer dielectric phase masks allow for the realization of the miniaturization of high-quality optical elements. In this Letter we demonstrate spatial intensity beam shaping using phase masks attached to optical single-mode fibers. The phase masks are directly fabricated onto the end facet of optical fibers using femtosecond two-photon direct laser writing, achieving, therefore, submicrometer alignment accuracy. We observe high-quality intensity patterns and find excellent agreement with simulations. Our results prove that 3D printing of diffractive micro-optics can achieve sufficient performance to enable compact devices. (C) 2016 Optical Society of America